发明名称 |
DEEP ULTRAVIOLET RAY PHOTORESIST COMPOSITE CONTAINING POLYCYCLIC CYCLOPENTANE-2- DIAZO-1, 3-DIONE |
摘要 |
PURPOSE: To ensure peak absorption in a deep UV region by mixing a specified resin binder soluble or swellable in an aq. alkali soln. and a specified compd. with a solvent compsn. CONSTITUTION: A photosensitive compsn. is obtd. by mixing a resin binder insoluble in water but soluble or swellable in an aq. alkali soln. and a compd. represented by formula I, II, etc., with an enough solvent compsn. to prepare a practically uniform mixture. The amt. of the resin binder and that of the compd. are about 65-98% and about 2-35% of the weight of the photosensitive compsn. except the solvent compsn., respectively. The photosensitive compsn. can be imagewise exposed with UV in the range of about 200-300nm. |
申请公布号 |
JPH03213864(A) |
申请公布日期 |
1991.09.19 |
申请号 |
JP19900172560 |
申请日期 |
1990.06.29 |
申请人 |
HOECHST CELANESE CORP |
发明人 |
CHIENJIYU U;AN EMU MUURINGU;JIEEMUZU TEII YAADORII |
分类号 |
G03F7/004;C07C13/10;C07C245/12;G03F7/016;G03F7/039;H01L21/027 |
主分类号 |
G03F7/004 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|