发明名称 DEEP ULTRAVIOLET RAY PHOTORESIST COMPOSITE CONTAINING POLYCYCLIC CYCLOPENTANE-2- DIAZO-1, 3-DIONE
摘要 PURPOSE: To ensure peak absorption in a deep UV region by mixing a specified resin binder soluble or swellable in an aq. alkali soln. and a specified compd. with a solvent compsn. CONSTITUTION: A photosensitive compsn. is obtd. by mixing a resin binder insoluble in water but soluble or swellable in an aq. alkali soln. and a compd. represented by formula I, II, etc., with an enough solvent compsn. to prepare a practically uniform mixture. The amt. of the resin binder and that of the compd. are about 65-98% and about 2-35% of the weight of the photosensitive compsn. except the solvent compsn., respectively. The photosensitive compsn. can be imagewise exposed with UV in the range of about 200-300nm.
申请公布号 JPH03213864(A) 申请公布日期 1991.09.19
申请号 JP19900172560 申请日期 1990.06.29
申请人 HOECHST CELANESE CORP 发明人 CHIENJIYU U;AN EMU MUURINGU;JIEEMUZU TEII YAADORII
分类号 G03F7/004;C07C13/10;C07C245/12;G03F7/016;G03F7/039;H01L21/027 主分类号 G03F7/004
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