| 摘要 |
PURPOSE:To realize the short time exposure of a pattern whose line width is 0.4mum or less, by constituting an aligner by using a spiral orbit type undulator inserted into an electronic storage ring, and an exposing chamber provided with a reflection optical system which performs demagnification projection applying the undulator radiation generated from the undulator to a light source. CONSTITUTION:The title aligner is constituted of the following; a spiral orbit type undulator 10 inserted into an electronic storage ring 11, and an exposing chamber provided with a reflection optical system which performs demagnification projection applying the undulator radiation generated from said undulator 20 to a light source. The undulator radiation 20 is projected on a wafer 25 by a Schwarzschild's reflecting mirror 24, after being vertically reflected by a reflecting mirror 21 and passing a reticle 22. A pattern on the reticle 22 is reduced to be about 1/4 and forms an image on the wafer 25. Thereby an aligner capable of the short time exposure of a pattern whose line width is 0.4mum or less can be obtained. |
