| 摘要 |
PURPOSE:To improve the etching property, plating property, etc., of the resist by compounding a specific alkali-soluble novolak resin with the compsn. CONSTITUTION:This compd. is compounded with the alkali-soluble novolak resin (A) and a photosensitizer essentially consisting of naphthoquinine diazide sulfonate. The resin contg. 20 to 80wt.% o-cresol novolak resin (B) having a weight average mol. wt. (Mw) ranging 800 to 1,500 and the ratio MW/Mn between the mol. wt. Mw and number average mol. wt. (Mn) ranging 1.5 to 3.0 is used as the component A. The alkali-soluble novolak resin having the mol. wt. Mw within a 5,000 to 15,000 range is preferably incorporated as the novolak resin exclusive of the component B into the component A. |
