发明名称 COMPOSITION FOR RESIST
摘要 PURPOSE:To improve the storage property of the compsn. for a resist by incorporating enzyme into the above compsn. CONSTITUTION:A resin (A), a photosensitive agent and enzyme (B) are incorporated into this compsn. A novolak resin is preferably used for the component A and ribonuclease is used for the component B. The desired resolution is attained even if the compsn. is preserved over a long period of time by adding the component B to the compsn.
申请公布号 JPH03208052(A) 申请公布日期 1991.09.11
申请号 JP19900001552 申请日期 1990.01.10
申请人 FUJITSU LTD 发明人 KOJIRI HIDEHIRO
分类号 G03F7/004;G03F7/022;H01L21/027 主分类号 G03F7/004
代理机构 代理人
主权项
地址