Positive type photoresist composition.

摘要

A novel positive type photoresist composition is provided comprising a quinodiazide compound and an alkali-soluble resin as essential components, characterized in that there is contained at least one of compounds represented by formulae (I) to (VI): <CHEM> <CHEM> The positive type photoresist of the present invention exhibits excellent sensitivity, percent film remaining, resolution, heat resistance, resist shape and developability.