POSITIVE PHOTORESIST COMPOSITIONS HAVING DEEP UV RESPONSE, PHOTOSENSITIVE ELEMENTS AND THERMALLY STABLE PHOTOCHEMICALLY IMAGED SYSTEMS CONTAINING SAME,申请号EP19840112439-传众专利搜索

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发明名称	POSITIVE PHOTORESIST COMPOSITIONS HAVING DEEP UV RESPONSE, PHOTOSENSITIVE ELEMENTS AND THERMALLY STABLE PHOTOCHEMICALLY IMAGED SYSTEMS CONTAINING SAME
摘要
申请公布号	EP0140273(B1)	申请公布日期	1991.09.11
申请号	EP19840112439	申请日期	1984.10.16
申请人	HOECHST CELANESE CORPORATION	发明人	HOPF, F. R.;OSUCH, C. E.;MCFARLAND, M. J.
分类号	G03F7/20;C08F22/36;C08F22/40;C08G73/12;C08L33/24;C08L35/00;G03C1/72;G03C5/08;G03F7/004;G03F7/023;G03F7/039;H01L21/027	主分类号	G03F7/20
代理机构		代理人
主权项
地址

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