| 摘要 |
<p>PURPOSE:To make it possible to correct different defects such as a pinhole-like defect by providing correcting patterns which correct the pattern's defects of an X-ray absorbing layer of an X-ray mask on the back of a thin film transparent to X rays. CONSTITUTION:An X-ray absorber pattern 4 may includes pinhole-like defects 5 of high aspect ratio, defects 6 due to broken edges on the lower side of the pattern 4, and step-like defects 7 due to broken corners. A fine pattern 8 for correcting the defects 5-7 are formed corresponding to the defects 5-7 on the back of a thin film 2 transparent to X rays. That is, the X rays passing through the defects 5-7 of the pattern 4 are absorbed certainly by the correcting pattern 8, and do not reach a substance to be exposed. Thereby, the various defects of the pattern 4 formed on the surface of the thin film 2 are corrected surely.</p> |
