发明名称 FINE PATTERN FORMATION
摘要 PURPOSE:To allow easy fine pattern formation in low vacuum or atmospheric air by applying a voltage between a needle and a substrate under the condition that the fine-tip conductive needle is brought to the distance which allows tunnel current to flow between needle and the substrate at a desired part on the substrate. CONSTITUTION:When a substrate 11 is placed in atmospheric air or in low vacuum, contamination 12 floating around the substrate is adsorved and accumulated. Then, when a needle 13 is brought closed to the surface of the substrate 11 and a voltage 14 is applied between the substrate 11 and the needle 13, a local electric field 15 is formed. Since the contamination 12 in the local electric field 15 receives energy from the field 15, when the needle 13 is scanned on the substrate, the fine pattern 12 of a contamination film is formed on the substrate 11. Thus, when the pattern is used as the mask for etching, etc., a fine pattern is easily formed.
申请公布号 JPH03208327(A) 申请公布日期 1991.09.11
申请号 JP19900003096 申请日期 1990.01.09
申请人 NEC CORP 发明人 BABA MASAKAZU
分类号 H01L21/302;G01N37/00;G01Q60/10;G01Q60/38;G01Q80/00;H01L21/027;H01L21/30 主分类号 H01L21/302
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