发明名称 Method of manufacturing titanium magnetic disk substrate.
摘要 <p>After the surface roughness of a titanium substrate is set to be Rmax &lt;/= 0.08 mu m, a hardened layer having a hardness of Hv &gt;/= 250 is formed thereon to have a thickness of 50 to 250 mu m by sputtering, thereby manufacturing a titanium magnetic disk substrate.</p>
申请公布号 EP0445732(A2) 申请公布日期 1991.09.11
申请号 EP19910103310 申请日期 1991.03.05
申请人 NKK CORPORATION 发明人 SUENAGA, HIROYOSHI, C/O PATENT & LICENSE DEPT.;FUKAI, HIDEAKI, C/O PATENT & LICENSE DEPT.;SAKIYAMA, TOSHIO, C/O PATENT & LICENSE DEPT.;MINAKAWA, KUNINORI, C/O PATENT & LICENSE DEPT.
分类号 B29D17/00;C23C14/02;C23C14/06;C23C14/08;C23C14/14;G11B5/66;G11B5/73;G11B5/738;G11B5/84;G11B5/82 主分类号 B29D17/00
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