| 摘要 |
PURPOSE:To highly accurately transfer a pattern by changing the height position of a light shielding film in an optical axial direction in responce to the flactuation of height position in the optical axial direction of the photosensitive layer of the exposure part of an object to be exposed. CONSTITUTION:In responce to the fluctuation of the height position in the optical axial direction of the photosensitive layer in the exposure part of the exposed material 1 whose patterns are transfered by the exposed light or expo sure X-ray transmitted through a mask 4 the height position in the optical direction of the light shielding film or the X-ray absorbing film corresponding to the exposure part is changed. For example, since the ruggedness of a previous ly formed pattern group is reflected on the object to be exposed 1 and height differences HW1 and HW2 are formed thereon with respect to a reference surface PW, this mask 4 is provided with height differences HM1 and HM2 corresponding to that of the object to be exposed 1. Thus, these pattern can be highly accurately transferred. |
