| 摘要 |
PURPOSE:To obtain diffused light having a less wavelength distribution by continuously changing the period of the multilayered structure films on a substrate in the horizontal direction of the substrate and oscillating a reflecting mirror. CONSTITUTION:The period of the multilayered structure film 2 of the substrate 3 on the reflecting mirror 4 changes continuously in the horizontal direction and the thicknesses of the respective layers in the films increase continuously from the incident side toward the exit side of the radiant light 1. Such film formation is obtd. by controlling the shutter provided on the substrate side with time. The reflecting mirror 4 is oscillated in an arc shape around a revolving shaft 13 via a control computer 12, a controller 11, a driver 10, and a driving actuator 9. The diffused light having the less wavelength distribution of <=200nm wavelength light which is UV rays is, therefore, obtd. The need for correcting the unequal exposing corresponding to the spectral sensitivity of a resist is eliminated. |
