Exposure apparatus.

摘要

An exposure apparatus for transferring a pattern of an original (1) onto a workpiece (2) by using first light, includes a blocking member (4) for defining a rectangular exposure region on the workpiece. The blocking member (4) has a function for blocking the first light, wherein, through the exposure region defined by the blocking member (4), exposure for the pattern transfer can be effected. A detecting device (6) detects a positional deviation between the original (1) and the workpiece (2), by using second light different from the first light, wherein the blocking member (4) has a portion for transmitting the second light such that the detecting device (6) can detect the positional deviation with the second light passed through that portion of the blocking member. <IMAGE>