| 摘要 |
<p>PURPOSE:To expand the width of selective etching performed on a functional thin film, and to make it possible to perform a selective etching on an electrode material by a method wherein the electrode layer which comes in contact with the functional thin film is formed with the metal for which an etchant to be used is specified. CONSTITUTION:Nichrome is vapor-deposited on the surface of an alumina magnetic substrate using a vacuum evaporation method, and subsequently nickel is vapor-deposited. Then, the vapor-deposited substrate is formed into a temperature-sensing film by conducting a heat treatment in argon gas. Subsequently, a gold film 5 and a copper film 6 are provided as an electrode by vapor deposition. A pattern is formed on the vapor-deposited substrate using a photoresist 7. This substrate is dipped into a ferric chloride solution, and the copper layer is etched. Then, the substrate is dipped into an iodine solution, the gold layer is etched, and it is formed into an electrode. Besides, the temperature-sensing film is patterned using a ferric chloride solution. Subsequently, resistance value trimming is conducted using a laser beam, and a prescribed resistance value is obtained.</p> |
