| 摘要 |
PURPOSE:To improve sensitivity, resolution, heat resistance, shelf stability, the rate of a residual film, etc., by incorporating alkali-soluble phenol resin, a quinonediazidosulfonic ester type photosensitive agent and a specified compd. CONSTITUTION:This positive type resist compsn. contains alkali-soluble phenol resin, a quinonediazidosulfonic ester type photosensitive agent and a compd. represented by formula I and/or a compd. represented by formula II. In the formulae I, II, each of R1-R10 is H, halogen, hydroxyl, 1-3C alkyl, 1-3C alkenyl or 1-3 optionally substd. alkoxy but R8 in the formula II is H or alkyl. Sensitivity, resolution, heat resistance, shelf stability, the rate of a residual film, etc., are improved. |
