Measuring electrode for monitoring electroless metal deposition baths - has small surface curvature or area and gives clear deposition assessment
摘要
For monitoring electroless metal deposition baths by measuring voltage between a measuring electrode in the bath and a reference electrode, the measuring electrode has a small surface curvature, through use of wires of small dia., or small surface areas in contact with the metallising soln., through use of small dimension conductor structures on a dielectric substrate. Pref. dia. or width is between 50mm and 2mm.. ADVANTAGE - Gives clear and sensitive assessment of deposition characteristics.
申请公布号
DE4011683(C1)
申请公布日期
1991.08.29
申请号
DE19904011683
申请日期
1990.04.06
申请人
SCHERING AG BERLIN-BERGKAMEN, 1000 BERLIN, DE
发明人
PIETSCH, KARL-HEINZ;ZWERNEMANN, ULLRICH;BRESSEL, BURKHARD, DR., 1000 BERLIN, DE