发明名称 Measuring electrode for monitoring electroless metal deposition baths - has small surface curvature or area and gives clear deposition assessment
摘要 For monitoring electroless metal deposition baths by measuring voltage between a measuring electrode in the bath and a reference electrode, the measuring electrode has a small surface curvature, through use of wires of small dia., or small surface areas in contact with the metallising soln., through use of small dimension conductor structures on a dielectric substrate. Pref. dia. or width is between 50mm and 2mm.. ADVANTAGE - Gives clear and sensitive assessment of deposition characteristics.
申请公布号 DE4011683(C1) 申请公布日期 1991.08.29
申请号 DE19904011683 申请日期 1990.04.06
申请人 SCHERING AG BERLIN-BERGKAMEN, 1000 BERLIN, DE 发明人 PIETSCH, KARL-HEINZ;ZWERNEMANN, ULLRICH;BRESSEL, BURKHARD, DR., 1000 BERLIN, DE
分类号 C23C18/16;G01N27/416 主分类号 C23C18/16
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