| 摘要 |
Novolak resins which possess a high glass transition temperature ("Tg"), and which are particularly suited for use in high resolution photoresist compositions, are provided. The resins are prepared by the condensation reaction of formaldehyde with multi-substituted phenol, for example 3,5-dimethyl phenol, resorcinol compound, and, optionally, another phenol. Novolak resins having Tg's greater than about 120 degrees Centigrade are preferred. |
