Planarized, reusable calibration grids

摘要

An improved structure for electron beam lithography grids and a method of fabricating such grids yields calibration grids having grid lines coplanar with the surface of a the grid body and laterally supported by grooves formed in the grid body and which can also be cleaned after contamination by outgassing resist during use by virtue of the provision of such lateral support for the grid lines. The grid exhibits improved accuracy due to the technique of fabrication of the grooves. The invention thus allows the electron beam lithography process to be conducted with less expense and at a greater speed. The improved accuracy of the calibration grid also permits integrated circuits and masks used in the fabrication of such devices to be designed more flexibly and fabricated at reduced cost and improved integration densities and manufacturing yields.