发明名称 Positive-working quinone diazide photoresist composition containing a dye
摘要 A positive type photoresist composition comprising at least one alkali-soluble resin, at least one quinone diazide compound and a compound of the general formula (I) <IMAGE> (I) wherein R1 and R2 represents alkyl groups having 1 to 8 carbon atoms or a cycloalkyl group having 1 to 8 carbon atoms, R3 represents hydrogen, an alkyl group having 1 to 4 carbon atoms or halogen, R4 represents hydrogen or a cyano group and R5 represents a cyano group or a carboxyl group.
申请公布号 US5043243(A) 申请公布日期 1991.08.27
申请号 US19890437929 申请日期 1989.11.17
申请人 NIPPON ZEON CO., LTD. 发明人 YAJIMA, MIKIO;KAMIYA, SHIGEMITSU;KAWATA, SHOJI
分类号 G03C1/72;C08K5/18;C08K5/28;C08L61/04;C08L61/06;G03F7/004;G03F7/022;G03F7/023;G03F7/039;G03F7/09;H01L21/027 主分类号 G03C1/72
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