| 摘要 |
A rotating head assembly of apparatus for applying a liquid photoresist solution to a semiconductor wafer includes a lower disk and an upper disk to be placed on the surface of the lower disk. On the surface of the lower disk, there are provided ribs for positioning the upper disk and the wafer so as to align the center thereof into the center of rotation. The height of the rib and the thickness of the upper disk are respectively the same as the thickness of the wafer. Magnetic means holds the upper and lower disk together.
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