RADIATION-SENSITIVE POSITIVE RESIST COMPOSITION

摘要

A positive resist composition comprising a 1,2quinone diazide compound and an alkali-soluble resin which comprises a resin (I) obtainable through a condensation reaction of an aldehyde with a phenol mixture containing mcresol and at least one selected from the group consisting of 2-tert.-butyl-4-methylphenol and 2-tert.-butyl-6-methyl-phenol, which has well balanced properties.