发明名称 Compound semiconductor substrate and method of manufacturing the same.
摘要 <p>According to this invention, there is provided a compound semiconductor substrate (16) including, on a compound semiconductor base (12) containing a high-concentration impurity, a high-resistance single-crystal layer (14) consisting of the same compound semiconductor as the compound semiconductor constituting the base. Active elements are formed in the high-resistance single-crystal layer (14). <IMAGE></p>
申请公布号 EP0442414(A2) 申请公布日期 1991.08.21
申请号 EP19910101865 申请日期 1991.02.11
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 IWASAKI, HIROSHI, C/O INTELLECTUAL PROPERTY DIV.
分类号 H01L21/762;H01L21/20;H01L21/203;H01L21/205;H01L27/12;H01L29/10 主分类号 H01L21/762
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