| 摘要 |
The present invention relates to a polishing cloth comprising an expanded thermoplastic resin product having a cellular structure, and an expansion ratio of 1.5-fold to 30-fold, with substantially uniform cells having an average cell diameter of 300 mu m or less being distributed within the cross-section of the expanded product, and with unexpanded resin phase of 0.5 mu m to 45 mu m surrounded by three or more cells, wherein the proportion of the unexpanded phases are 0.01% to 70% in terms of area ratio within the expanded product cross-section, which has excellent performance of mirror surface polishing, for example, integrated circuit substrate, disc substrate for information recording, optical lens, optical mirror, etc. The present invention particularly relates to a polishing cloth for precise polishing to a surface roughness of 100 ANGSTROM or less. |
