发明名称 |
PROCESS FOR THE PRODUCTION OF A PROTECTIVE LAYER OR A RELIEF IMAGE |
摘要 |
Process for the production of a protective layer or a relief image A process for the production of a protective layer or a relief image on a substrate, wherein a radiation-sensitive layer, consisting of a solid film-forming epoxy resin containing a photoinitiator, which can be activated by radiation, for the polyaddition reaction, is transferred from a support to a substrate, then exposed directly or under a photomask and hardened by the action of heat, after which, if appropriate, the unexposed parts are developed with a solvent. The process is suitable, for example, for the production of printed circuits, solder resist masks and offset printing plates.
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申请公布号 |
CA1287769(C) |
申请公布日期 |
1991.08.20 |
申请号 |
CA19850473852 |
申请日期 |
1985.02.08 |
申请人 |
CIBA-GEIGY AG;CIBA-GEIGY AG;CIBA-GEIGY AG |
发明人 |
ZWEIFEL, HANS;BAUER, SIGRID;BAUER, SIGRID;BAUER, SIGRID;MEIER, KURT;MEIER, KURT;MEIER, KURT |
分类号 |
G03C5/00;C08G59/68;C08J3/28;C08J7/04;G03C1/00;G03F7/038;G03F7/11;H05K3/00;(IPC1-7):G03F7/11;C07F1/10 |
主分类号 |
G03C5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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