发明名称 PROCESS FOR THE PRODUCTION OF A PROTECTIVE LAYER OR A RELIEF IMAGE
摘要 Process for the production of a protective layer or a relief image A process for the production of a protective layer or a relief image on a substrate, wherein a radiation-sensitive layer, consisting of a solid film-forming epoxy resin containing a photoinitiator, which can be activated by radiation, for the polyaddition reaction, is transferred from a support to a substrate, then exposed directly or under a photomask and hardened by the action of heat, after which, if appropriate, the unexposed parts are developed with a solvent. The process is suitable, for example, for the production of printed circuits, solder resist masks and offset printing plates.
申请公布号 CA1287769(C) 申请公布日期 1991.08.20
申请号 CA19850473852 申请日期 1985.02.08
申请人 CIBA-GEIGY AG;CIBA-GEIGY AG;CIBA-GEIGY AG 发明人 ZWEIFEL, HANS;BAUER, SIGRID;BAUER, SIGRID;BAUER, SIGRID;MEIER, KURT;MEIER, KURT;MEIER, KURT
分类号 G03C5/00;C08G59/68;C08J3/28;C08J7/04;G03C1/00;G03F7/038;G03F7/11;H05K3/00;(IPC1-7):G03F7/11;C07F1/10 主分类号 G03C5/00
代理机构 代理人
主权项
地址