| 摘要 |
<p>PURPOSE:To uniformly attract a dielectric substrate and a conductor substrate on a low voltage, and increasing the temperature controllability of the above substrates, by setting the thickness of each part of a three-layered structure of an alumina plate, an electrode, and an alumina plate ro be equal to a specified value. CONSTITUTION:A pair of tungsten electrodes 2a, 2b are formed on a 150mm diameter alumina plate 1 of 3.35mm in thickness. An alumina plate 3 is arranged on the pair of electrodes 2a, 2b; a power feeding hole is worked; these are sintered at a high temperature; the thickness of the alumina plate 3 is worked to be 100-300mum by finishing process. After that, the flatness of the alumina plate 3 surface is worked to be less than or equal to 10mum, and an electrostatic chuck electrode is obtained.</p> |
