VORRICHTUNG ZUM BEHANDELN VON SUBSTRATEN IN EINEM DURCH MIKROWELLEN ERZEUGTEN, GASGESTUETZTEN PLASMA

摘要

A device for treating substrates, in particular for applying a protection coating on the surface of optical reflectors (17) in a gas-based plasma (16) produced by microwaves, comprises a preferably drum-shaped vacuum recipient (1, 2) which contains the substrate (17) to be treated. The vacuum recipient (1, 2) has a gas inlet (6) and can be closed by a quartz glass (8) or similar window (7) through which the microwave energy produced by the external generator (11) enters the recipient (1, 2). The microwave energy is stored inside the recipient (1, 2) in a microwave antenna (12) in contact with the window (7).