VERFAHREN ZUR ERZEUGUNG EINES GEWUENSCHTEN MUSTERS AUF EINEM ZIEL MITTELS ELEKTRONENSTRAHLBELICHTUNG DESSELBEN.

摘要

In a method of drawing a desired pattern on a target through exposure thereof with an electron beam, a pattern area on the target surface is defined by first units of exposed areas arranged in rows and columns and is exposed by a first electron beam. A background area other than the pattern area on the target surface is also defined by secondary units of exposed areas which are arranged in rows and columns, and is exposed by a secondary electron beam to compensate for the proximity effect. The secondary units have a size larger than that of the first units and the second electron beam forms on the target surface a second beam spot which is larger than the first beam spot formed on the target surface by the first electron beam so that the background area is exposed in a reduced period of time.