| 摘要 |
PURPOSE:To form fine resist patterns by adjusting the content of an acid component to a specified value or below. CONSTITUTION:Prescribed ratios of an alkali-soluble resin, 1, 2-quinonediazide compd., bisazide compd., various compounding agents, etc., are dissolved into solvents of ethers, such as dihexyl ether, aliphat. acids, such as caproic acid, and arom. hydrcarbons, such as xylene, and the soln. is filtered with a filter of about 0.2 mum pore size. The solvent is preferably in a 5 to 50wt.% range of the concn. of the solid content. The concn. of the acid component is adjusted to a range of <=1.0X10<-3>mili equiv./g, more preferably <=0.8X10<-3>mili equiv./g. The decreasing of the concn. of the acid component is so executed as to obviate the generation of an acid compd. or to allow the sufficient removal of the acid compd. at the time of synthesizing of the alkali-soluble resin which is the main component of the compsn. The fine resist patterns are formed in this way. |
