发明名称 POSITIVE TYPE RESIST COMPOSITION
摘要 PURPOSE:To improve a gamma value by using the quinonediazide sulfonate of a polyhydric phenol compd. having a specific structure. CONSTITUTION:The gamma value can be improved by using an alkali-soluble resin and the quinonediazide sulfonate of the polyhydric phenol compd. expressed by formula I. In the formula I, Y1, Y2, Z1, Z2, Z3, Z4, Z5, Z6; C1 to C4 alkyl groups which may be substd. with halogen atom, a hydrogen atom or -OH group. Y1, Y2; At least one is a -OH group. Z1 to Z6; At least two are -OH group. R1 to R6; hydrogen atom, C1 to C10 alkyl group, C1 to C4 alkenyl group, cycloalkyl group or aryl group.
申请公布号 JPH03185447(A) 申请公布日期 1991.08.13
申请号 JP19890325350 申请日期 1989.12.14
申请人 SUMITOMO CHEM CO LTD 发明人 KAMIYA YASUNORI;NAKANISHI HIROTOSHI;DOI YASUYOSHI
分类号 G03F7/022;G03F7/039;H01L21/027 主分类号 G03F7/022
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