| 摘要 |
PURPOSE:To produce the title high-purity and stable fine copper powder by allowing the vapor of cuprous chloride to react with a reducing gas in the vapor phase at a specified reaction temp. CONSTITUTION:Cuprous chloride contained in a quartz boat 3 is heated and vaporized in a vaporization part 2 in a reactor 1. The vapor is sent to a reaction part 5 through a carrier gas 4 such as argon. The cuprous chloride vapor is allowed to react with a reducing gas 7 such as gaseous hydrogen sent from a nozzle 6 in the vapor phase in the reaction part. In this case, the reaction temp. is controlled to 700-900 deg.C, and the residence time to about 0.05-5sec. The gaseous reaction product is cooled in a cooling part 8 to obtain the high-purity fine copper powder 9 consisting essentially of a single crystal and with the surface stabilized and difficult to oxidize. The fine copper powder thus obtained has about 0.1 to several mum particle diameter, and is appropriately used for the filler for a high-temp. sintering-type conductive paste. |
