发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 Disclosed is a photosensitive resin composition which has improved water developability and storage stability. The composition comprises (I) crosslinked resin particles prepared by a post-emulsion method from (a) a base resin having a glass transition temperature (Tg) of 0 DEG C or less and a polymerizable double bond, (b) a monomer which, when polymerized, provides a resin in which Tg is 20 DEG C higher than that of the base resin, or a resin in which Tg is 20 DEG C higher than that of the base resin, (c) a polyvinyl compound, and (d) a polymerization initiator (II) a photopolymerizable unsaturated monomer, and (III) a photopolymerization initiator. p
申请公布号 AU7018991(A) 申请公布日期 1991.08.08
申请号 AU19910070189 申请日期 1991.02.01
申请人 NIPPON PAINT CO., LTD. 发明人 HISAICHI MURAMOTO;YUSUKE NINOMIYA;KEIZOU ISHII;SHINICHI ISHIKURA
分类号 G03F7/033;G03F7/027;H05K3/00 主分类号 G03F7/033
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