发明名称 IMPROVED METHOD AND MEANS FOR PRODUCING PHOTOMASKS
摘要 <p>A novel photomask structure and method of producing photomasks using a non-contacting spark-discharge recording apparatus. The recording constructions of the present invention comprise a conductive layer, a layer transparent to the radiation that will be used to expose the target photosensitive material and, optionally, a coating layer deposited over the metal layer.</p>
申请公布号 WO1991011754(A1) 申请公布日期 1991.08.08
申请号 US1991000668 申请日期 1991.01.29
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