| 摘要 |
<p>PURPOSE:To form a vertical magnetizing film on a flexible substrate at a high speed by using a couple of targets, facing mutually in parallel, as cathodes and by forming the vertical magnetizing film on the substrate arranged sideward by the sputtering of those targets. CONSTITUTION:Holders 15 and 16 fixed to the side plates 11 and 12 of a vacuum container 10 through insulating members 13 and 14 are provided with counter target type cathodes composed of a couple of targets T1 and T2 each made primarily of Co while their target surfaces are opposed in parallel with a space, and a substrate holding means 41 consisting of a feed roll 41a, a support roller 41b, and a take-up roll 41c is arranged aside of the targets T1 and T2. Then, the container 10 is evacuated by an exhaustion system 20, and prescribed gas is introduced into the container 10 through a gas introduction system 30 to 10<-1>- 10<-4> Torr pressure; and DC currents are supplied from power supplying means 52 and 53 to the targets T1 and T2 to perform sputtering onto a substrate 40 supplied on the roll 41b, thus forming a vertical magnetized film.</p> |
