发明名称 |
Plasma processing apparatus including an electromagnet with a bird cage core |
摘要 |
A plasma etching apparatus comprises a chamber, a holding table for holding samples, such as a semiconductor substrate to be etched, in the chamber, a plasma-generating device for generating a plasma within the chamber, and a magnetic-field-forming device which forms a magnetic field perpendicular to the surface of the sample placed on the holding table and parallel the inner wall of the chamber.
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申请公布号 |
US5038013(A) |
申请公布日期 |
1991.08.06 |
申请号 |
US19900562669 |
申请日期 |
1990.08.03 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
AKAZAWA, MORIAKI;MARUYAMA, TAKAHIRO;OGAWA, TOSHIAKI;MORITA, HIROSHI;ISHIDA, TOMOAKI |
分类号 |
H01L21/302;H01J37/32;H01L21/3065 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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