发明名称 Method of and device for sub-micron processing a surface
摘要 A method of and a device for sub-micron deforming a surface (15) is described, for example for the purpose of inscribing information. During scanning of the surface the tip (14) of a scanning tunneling microscope is held at a constant distance from the surface by means of a negative feedback control loop (18) which is controlled by a tunneling current (It) between the tip and the surface, and for forming a pit (21) in the surface (15) the control loop is deactivated and a tip height drive member (8) is energized by means of a control voltage (Vpz) whose amplitude increases as a function of time and which has a predetermined final value, such that the tip is lowered into the material.
申请公布号 US5038322(A) 申请公布日期 1991.08.06
申请号 US19890306367 申请日期 1989.02.03
申请人 U.S. PHILIPS CORPORATION 发明人 VAN LOENEN, EVERT J.
分类号 B82B3/00;G01N37/00;G01Q60/10;G01Q80/00;G11B3/00;G11B9/00;G11B9/14;G11B11/00;H01L21/027 主分类号 B82B3/00
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