发明名称 |
Hydroxylated aromatic polyamide polymer containing bound naphthoquinone diazide photosensitizer, method of making and use |
摘要 |
A photosensitive alkali-soluble, thermally-stable fluorinated hydroxy-resinous polyamide or polyimide composition comprising a resin-bound diazo sensitizer incorporated by the reaction of an o-quinone diazide sulfonyl chloride sensitizer compound with a predetermined percentage of the hydroxy groups of the hydroxy-resin binder material. The present compositions are self-sensitized, have adjustable alkali-solubility and provide high speed photoresist compositions for producing relief patterns having good edge definition and high thermal stability.
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申请公布号 |
US5037720(A) |
申请公布日期 |
1991.08.06 |
申请号 |
US19890363245 |
申请日期 |
1989.06.08 |
申请人 |
HOECHST CELANESE CORPORATION |
发明人 |
KHANNA, DINESH N. |
分类号 |
G03F7/021;C08G69/32;C08G73/10;C08K5/42;C08L77/00;C08L77/06;C08L79/08;G03F7/023;G03F7/037;G03F7/038;H01L21/027 |
主分类号 |
G03F7/021 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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