METHOD OF DEPOSITING THIN FILMS CONSISTING MAINLY OF CARBON

摘要

While CVD (chemical vapour deposition) methods and enhanced CVD methods for coating a substrate with a carbon coating have recently been attracting considerable interest, problems have occurred hitherto of separation of the carbon coating from the underlying substrate due to differential thermal expansion or contraction. The present invention discloses a modification of the conventional CVD process for carbon deposition in accordance with which the deposition conditions are changed in order that the hardness of the carbon coating at the interface between the coating and the underlying substrate is lower than that at the external surface of the coating.