Directly writing multibeam lithography system - has substrate markers with radiation energy source, generating first number of radiation beams

摘要

The system is used for marking a substrate (104) by marking elements (101), coacting with a first radiation energy source for generting a first number of radiation beams. An aligning system (102) is used for bringing the substrate in line with the radiation beams. The aligning system pref. contains optical members. The aligniong system may contain an illuminator (106) for the substrate, and an observing arrangement (107) for the illuminated substrate. The marking device contains marking elements and a first radiation energy source, a radiation beam reduction lens (103) focussing the radiation beam on coupling to the marking elements, and the observing arrangement optically coupled to the reduction lesn for the substrate viewing. USE/ADVNATAGE - Chip marking by laser scanner, with improved aligning.