发明名称 DEVELOPING DEVICE FOR PHOTORESIST
摘要 PURPOSE:To allow development to patterns of high accuracy by using a conductivity meter of an electromagnetic induction type as a sensor to detect the activity degree of a developing soln. and controlling the supply rate of a replenishing liquid from a replenishing liquid tank to a developing tank according to the conductivity of the developing soln. measured by this conductivity meter. CONSTITUTION:This device has the developing tank 11 filled with the developer A, the replenishing liquid tank 14, replenishing liquid supplying means 15, 16 which supply the replenishing liquid B in the replenishing liquid tank 14 to the developing tank 11, the sensor 17 for detecting the activity degree of the developer A, and a control section 26 for controlling the supply rate of the replenishing liquid B from the replenishing tank 14 to the developing tank 11 according to the activity degree of the developer A detected by the sensor 17. The sensor 17 is the conductivity meter of an electromagnetic induction type. The conductivity of the developer A changes in correspondence to a change in the difference in pattern conver sion by the development (the error of the pattern size of the developed photoresist film with respect to the pattern size of an exposing mask) and, therefore, the supply rate of the replenishing liquid B is so controlled as to maintain the conductivity at which the difference in the pattern conversion decreases to zero. The activity degree of the developer is maintained nearly constant and the photoresist film is always developed to the high-accuracy patterns.
申请公布号 JPH03177843(A) 申请公布日期 1991.08.01
申请号 JP19890316366 申请日期 1989.12.07
申请人 CASIO COMPUT CO LTD 发明人 SATO AKIRA
分类号 G03F7/30;G01N27/72;H01L21/027;H01L21/30 主分类号 G03F7/30
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