| 摘要 |
PURPOSE:To make regulation of a pressure easy and always apply a constant weight by a method wherein the pressure applied to a brush is regulated in accordance with a balsnce of the brush and a weight. CONSTITUTION:A wafer 10 sucked by a vacuum chuck is rotated by a motor 2 and is washed by pure water from a pure water nozzle 3. A brushing portion is moved onto the wafer 10 and is pressed downward by an air cylinder 4. An optional pressure can be applied to the brushing portion by a weight balance of a weight 6 and a brush 7 with a fulcurm 5 as a center. Dust on the wafer 10 is removed by the rotation of the brush 7, the rotation of the wafer 10 and the pure water from the pure water nozzle 3. After removing of the dust is finished, the brushing portione 10 is retired and the water is dried by dry air. The pressure is measured by hooking a spring balance to the brush cover of the wafer 10 and is regulated by sliding the weight. |
