Iron/iron nitride multilayer films.

摘要

In the present invention, magnetic multilayers comprising alternating iron and non-magnetic spacer layers form a multilayer magnetic film. In this multilayer magnetic film, the ratio of iron layer thickness to spacer layer thickness may be between 2 to 1 and approximately 5 to 1. Further, according to the present invention, the iron layer may have a thickness of between approximately 10 nm and approximately 100 nm. More particularly, the present invention is directed to material comprising alternating layers of iron and iron nitride. An iron/iron nitride multilayer film according to the present invention, may be manufactured using a sputter deposition process by sputtering a single layer of iron on a sputter substrate in the substantial absence of nitrogen. Followed by sputtering a single layer iron on the iron layer in an inert gas atmosphere, including a nitrogen component, to form a non-ferromagnetic spacer layer. Repeating the process to form a desired thickness of alternating layers of iron/iron nitride.