发明名称 PHOTOCURABLE RESIN COMPOSITION
摘要 A photocurable resin composition comprising (a) a modified resin prepared by reacting an .alpha.,.beta.-unsaturated dicarboxylic acid anhydride adduct having a softening point ranging from 70 to 200 .degree.C and derived from a conjugated diene polymer or copolymer having a number average molecular weight of 500 to 5000 and a vinyl content of 50 mole % or above, with an .alpha.,.beta.-unsaturated monocarboxylic acid ester having an alcoholic hydroxy group represented by the following formula (I), (I) wherein R1 and R2 each represent hydrogen or methyl, and R3 represents a hydrocarbon residue having at least 2 carbon atoms which may contain a heteroatom therein, to cause ring opening at least 10 mole % of the acid anhydride present in the adduct, (b) a wax having a melting point of not higher than 100 .degree.C, and (c) a photopolymerization initiator.
申请公布号 CA2050574(A1) 申请公布日期 1991.07.31
申请号 CA19912050574 申请日期 1991.01.29
申请人 NIPPON PETROCHEMICALS, CO., LTD. 发明人 NARAHARA, HISAO;INOUE, SATORU;KUROKI, TERUHISA;YAMAGUCHI, TATSUO;OOMIKA, HIROYOSHI
分类号 C08L91/06;C08C19/28;C08F2/48;C08F2/50;C08F8/14;C08F8/46;C08F279/00;C08F279/02;C08F290/00;C08F290/12;C08F299/00;C08L13/00;C08L91/00;C09D5/00;C09D5/44;C09D109/00;G03F7/038;H05K3/28;(IPC1-7):C08F222/02;C08F236/04 主分类号 C08L91/06
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