发明名称 |
Radiation-sensitive mixture |
摘要 |
The invention relates to a radiation-sensitive mixture essentially consisting of (a) a water-insoluble binder or binder mixture which is soluble in aqueous alkaline solutions, (b) a compound which upon irradiation forms a strong acid and (c) one or more organic compounds which inhibit the solubility of (a) in aqueous alkaline solutions, where the organic compound (c) is a malonic acid ester. This radiation-sensitive mixture may be used to prepare photoresists.
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申请公布号 |
US5035979(A) |
申请公布日期 |
1991.07.30 |
申请号 |
US19890422456 |
申请日期 |
1989.10.17 |
申请人 |
BASF AKTIENGESELLSCHAFT |
发明人 |
NGUYEN-KIM, SON;HOFFMANN, GERHARD;SCHWALM, REINHOLD |
分类号 |
G03F7/039;G03F7/004;H01L21/027;H01L21/30 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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