发明名称 Radiation-sensitive mixture
摘要 The invention relates to a radiation-sensitive mixture essentially consisting of (a) a water-insoluble binder or binder mixture which is soluble in aqueous alkaline solutions, (b) a compound which upon irradiation forms a strong acid and (c) one or more organic compounds which inhibit the solubility of (a) in aqueous alkaline solutions, where the organic compound (c) is a malonic acid ester. This radiation-sensitive mixture may be used to prepare photoresists.
申请公布号 US5035979(A) 申请公布日期 1991.07.30
申请号 US19890422456 申请日期 1989.10.17
申请人 BASF AKTIENGESELLSCHAFT 发明人 NGUYEN-KIM, SON;HOFFMANN, GERHARD;SCHWALM, REINHOLD
分类号 G03F7/039;G03F7/004;H01L21/027;H01L21/30 主分类号 G03F7/039
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