| 摘要 |
PURPOSE:To inspect a focus extremely easily and accurately by providing a step to a board, providing patterns having sequentially different sizes at an upper stage, providing patterns of the same sizes as those of the above- mentioned patterns in parallel at a lower stage, and then observing the corresponding patterns. CONSTITUTION:A step pattern 2 is formed on a board 1, and coated with photoresist 3 in a flat surface state. With a mask 4 a resist pattern 5 is formed. Thus, patterns A, B, C are formed on the board 1, (a lower stage), and patterns A', B', C' are formed on the pattern 2 (an upper stage). The sizes of the patterns are set to A=A', B=B', C=C' and A<B<C. Then, whether a focus is proper or not is inspected by using an optical microscope. If the focus is proper, the sizes of the patterns are so observed as to be A=A', B=B' and C=C'. If the pattern sizes are different at the upper and lower stages, like A<A', B<B', C=C' or the pattern of smaller size is vanished in the observation. |
