| 摘要 |
<p>PURPOSE:To allow transfer with a high resolving power and high accuracy regardless of the shapes of transfer patterns by providing a light shielding member formed to the prescribed patterns and a phase member exposed by as much as prescribed width along the peripheral edge of the light shielding member on a transparent substrate. CONSTITUTION:The phase member 3 consisting of a transparent material is formed on the surface of the transparent substrate 1. The light shielding member 2 of the prescribed patterns consisting of Cr, MoSi, etc., is formed on the member 3. The member 2 is formed smaller by one size than the member 3 and the member 3 is exposed to the outside by as much as the prescribed width W along the peripheral edge of the member 2. The light which transmits only the substrate 1 and is spread to the regions of the member 3 and the member 2 by diffraction interferes with the light transmitted through the member 3 and is thereby negated with each other. The light intensity distribution of the projected image of a photomask is, therefore, steepened and the high resolving power is obtd.</p> |
