| 发明名称 |
PHOTORESIST COMPOSITIONS CONTAINING QUINONE SENSITIZER |
| 摘要 |
PHOTORESIST COMPOSITIONS CONTAINING QUINONE SENSITIZER Positive-working imaging compositions comprise a polymeric binder and a quinone sensitizer which provides alkali solubility to the composition when exposed to activating radiation. |
| 申请公布号 |
CA1286532(C) |
申请公布日期 |
1991.07.23 |
| 申请号 |
CA19860520257 |
申请日期 |
1986.10.10 |
| 申请人 |
DOMINH, THAP |
发明人 |
DOMINH, THAP;FLEMING, JAMES C.;LINDSTROM, MICHAEL J. |
| 分类号 |
G03C1/72;G03F7/004 |
主分类号 |
G03C1/72 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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