| 摘要 |
PCT No. PCT/JP88/00941 Sec. 371 Date Mar. 17, 1989 Sec. 102(e) Date Mar. 17, 1989 PCT Filed Sep. 16, 1988 PCT Pub. No. WO89/02572 PCT Pub. Date Mar. 23, 1989.A method for measuring a refractive index and a thickness of a dielectric thin film formed on a substrate. The method comprises the following four steps. A step for irradiating a thin film on a substrate with a monochromatic light of a wavelength lambda , changing the incident angle thereof so as to measure a change of the energy reflection ratio or reflectance in response to changes of the incident angle and detect two incident angles theta 1 and theta 2 which correspond to two extreme values of the reflectance change. A step for irradiating the thin film with a monochromatic light of a wavelength lambda ', changing an incident angle thereof so as to measure change of reflectance in response to the change of the incident angle and detect an incident angle theta 3 which corresponds to an extreme value of the energy change. A step for calculating the refractive indices and thicknesses of the thin film, on the basis of the incident angle values theta 1 and theta 2, changing the interference degree number used as a parameter. And a step for determining the thickness of the thin film and the refractive indices thereof with respect to the light of a wavelength lambda and the light of a wavelength lambda ', on the basis of the incident angle value theta 3 and the data calculated as mentioned above. The method makes it possible to easily and accurately carry out the measurement.
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