发明名称 PHOTOSENSITIVE RESIN PLATE
摘要 PURPOSE:To prevent the peeling of an antitack resin film by providing an adhesive layer between a photosensitive layer and the anti-block resin film. CONSTITUTION:The anti-block resin coating film is provided on the surface of the photosensitive layer through the adhesive layer. Namely, the adhesive layer adhesive to the photosensitive and anti-block layers and not strongly compatible with both layers is provided. Polyamides, cellulose derivatives, etc., are used as the resin for forming the anti-block resin coating film, and polyester- based resin, polyurethane-based resin, etc., are used as the essential component of the adhesive layer. Consequently, the peeling of the anti-block layer from the photosensitive layer is prevented.
申请公布号 JPH03167552(A) 申请公布日期 1991.07.19
申请号 JP19890306648 申请日期 1989.11.28
申请人 TOKYO OHKA KOGYO CO LTD 发明人 OTA KATSUYUKI;YAMAMOTO KAZUHITO;AOYAMA TOSHIMI
分类号 G03F7/11;G03F7/00 主分类号 G03F7/11
代理机构 代理人
主权项
地址