| 摘要 |
A semiconductor laser (1) has a super-lattice active layer to which a high density impurity as equal to or over 1 X 10<1><7> cm<-><3> is selectively diffused in the vicinity of a facet of the semiconductor laser (1), so that a high power output is realized. The active layer (14) in the impurity diffusion region (4) is formed in a three-layer structure comprising first, second and third semiconductor layers. The second semiconductor layer has an opposite type of conductivity as the first and third semiconductor layer, and is sandwiched thereby. In such a structure, a depletion layer is generated around the active layer (14), so that injection of current into the active layer is prevented. The blocking layer (18) also protects the active layer from the strain stress during a process of attaching the semiconductor laser to a heatsink. In the fabricating process, a dielectric is temporarily formed to be used as a mask in a selective diffusion and in a selective growth, so that it is not necessary to align a selective growth mask and an impurity diffusion region (4). An impurity selective diffusion into the multi-layer epitaxial layers having GaAs layer or AlGaAs layer as a surface layer is carried out using As compound as an impurity source, so that the crystal quality of the surface layer is hard to decrease. <IMAGE>
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