A system for monitoring and controlling the rate of growth of thin films in an atmosphere of reactant gases measures the UV absorbance of the atmosphere and calculates the partial pressure of the gases. The flow of reactant gases is controlled in response to the partial pressure.
申请公布号
US5032435(A)
申请公布日期
1991.07.16
申请号
US19890328918
申请日期
1989.03.27
申请人
THE UNITED STATES OF AMERICA AS REPRESENTED BY THE UNITED STATES DEPARTMENT OF ENERGY
发明人
BIEFELD, ROBERT M.;HEBNER, GREGORY A.;KILLEEN, KEVIN P.;ZUHOSKI, STEVEN P.
