发明名称 |
CARBON LAYER COATING METHOD |
摘要 |
A shaped element of germanium or silicon is coated with a layer of hard infra red transparent carbon. The carbon is deposited on the element, used as a cathode, in a glow discharge charge chamber by applying a D.C. voltage to a hydrocarbon gas at a pressure of e.g. 10-1 to 10-2 Torr. Prior to depositing the carbon the element may be heated and cleaned using argon ion bombardment. Layers of germanium and silicon may also be deposited using the gases germane and silane respectively. |
申请公布号 |
JPS57111220(A) |
申请公布日期 |
1982.07.10 |
申请号 |
JP19810130355 |
申请日期 |
1981.08.21 |
申请人 |
NATIONAL RES DEV CORP |
发明人 |
JIEFURI UIRIAMU GURIIN;ARAN HARORUDO RETEINGUTON |
分类号 |
C01B31/06;C23C16/26;C23C16/27;C23C16/503;C30B29/04;G02B1/10;H01L21/302;H01L21/31;H01L31/0216 |
主分类号 |
C01B31/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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